Design for Manufacturability and Yield for Nano-Scale CMOS

Design for Manufacturability and Yield for Nano-Scale CMOS

von: Charles Chiang, Jamil Kawa

Springer-Verlag, 2007

ISBN: 9781402051883 , 255 Seiten

Format: PDF

Kopierschutz: Wasserzeichen

Windows PC,Mac OSX Apple iPad, Android Tablet PC's

Preis: 118,99 EUR

  • System Signatures and their Applications in Engineering Reliability
    Spectral Method in Multiaxial Random Fatigue
    Field Emission in Vacuum Microelectronics
    Environmentally-Friendly Product Development - Methods and Tools
    Designing with Video - Focusing the user-centred design process
    IUTAM Symposium on Computational Physics and New Perspectives in Turbulence - Proceedings of the IUTAM Symposium on Computational Physics and New Perspectives in Turbulence, Nagoya University, Nagoya, Japan, September, 11-14, 2006
  • Space, Structure and Randomness - Contributions in Honor of Georges Matheron in the Fields of Geostatistics, Random Sets and Mathematical Morphology
    Linking and Aligning Scores and Scales
    Statistical Methods for Human Rights

     

     

     

     

     

     

 

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Design for Manufacturability and Yield for Nano-Scale CMOS


 

This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.


Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA