Low-Frequency Noise in Advanced MOS Devices

von: Martin von Haartman, Mikael Östling

Springer-Verlag, 2007

ISBN: 9781402059100 , 216 Seiten

Format: PDF

Kopierschutz: Wasserzeichen

Windows PC,Mac OSX Apple iPad, Android Tablet PC's

Preis: 142,79 EUR

  • Nanoscale Phenomena - Basic Science to Device Applications
    Characterization of Corrosion Products on Steel Surfaces
    Nanocomposites - Ionic Conducting Materials and Structural Spectroscopies
    Thermal Decomposition of Solids and Melts - New Thermochemical Approach to the Mechanism, Kinetics and Methodology
    Tissue Engineering I - Scaffold Systems for Tissue Engineering
    Microstructured Polymer Optical Fibres
  • Bulk Metallic Glasses - An Overview
    Molecular Techniques in the Microbial Ecology of Fermented Foods
    Modern Aspects of Electrochemistry 39
    Nanotechnologies, Hazards and Resource Efficiency - A Three-Tiered Approach to Assessing the Implications of Nanotechnology and Influencing its Development
    Capillary Forces in Microassembly - Modeling, Simulation, Experiments, and Case Study
    Fuel Cell Electronics Packaging

Mehr zum Inhalt

Low-Frequency Noise in Advanced MOS Devices


This is an introduction to noise, describing fundamental noise sources and basic circuit analysis, discussing characterization of low-frequency noise and offering practical advice that bridges concepts of noise theory and modelling, characterization, CMOS technology and circuits. The text offers the latest research, reviewing the most recent publications and conference presentations. The book concludes with an introduction to noise in analog/RF circuits and describes how low-frequency noise can affect these circuits.

The Book will be based on the following work which also is the publication list for Dr Martin von Haartman; Ph. D. Thesis: Low-frequency noise characterization, evaluation and modeling of advanced Si- and SiGe-based CMOS transistors, xx, 124 pages, 9 appended papers, Stockholm, April 2006. http://www.diva-portal.org/kth/theses/abstract.xsql?dbid=3888
M. von Haartman, D. Wu, B. G. Malm, P.-E. Hellström, S.-L. Zhang and M. Östling, 'Low-frequency noise in Si0.7Ge0.3 surface channel pMOSFETs with ALD HfO2/Al2O3 gate dielectrics', Solid-State Electronics, vol. 48, pp. 2271-2275, 2004.
D. Wu, M. von Haartman, J. Seger, E. Tois, M. Tuominen, P.-E. Hellström, M. Östling, S.-L. Zhang, 'Ni-salicided CMOS with a poly-SiGe/Al2O3/HfO2/Al2O3 gate stack', Microelectron Eng., vol. 77, pp. 36-41, 2005.
M. von Haartman, J. Westlinder, D. Wu, B. G. Malm, P.-E. Hellström, J. Olsson, S.-L. Zhang, M. Östling, 'Investigation of low-frequency noise and Coulomb scattering in Si0.8Ge0.2 surface channel pMOSFETs with ALD Al2O3 gate dielectrics', Solid-State Electronics, vol. 49, pp. 907-914, 2005.
J. Seger, P.-E. Hellström, J. Lu, B. G. Malm, M. von Haartman, M. Östling, and S.-L. Zhang, 'Lateral enroachment of Ni-silicide in the source/drain regions on ultra-thin silicon-on-insulator', Appl. Phys. Lett., vol. 86, 253507, 2005.
C. Isheden, P.-E. Hellström, M. von Haartman, H. H. Radamson, and M. Östling, 'pMOSFETs with recessed and selectively regrown Si1-xGex source/drain junctions', Mat. Sci. Sem. Proc., vol. 8, pp. 359-362, 2005.
M. von Haartman, B. G. Malm, and M. Östling, 'A comprehensive study on Low-frequency noise and mobility in Si and SiGe pMOSFETs with high-k gate dielectrics and TiN gate', IEEE Trans. Electron Devices, vol. 53, pp. 836-843, April 2006.
J. Hållstedt, M. von Haartman, P.-E. Hellström, M. Östling, and H. H. Radamson, 'Hole mobility in ultra thin body SOI pMOSFETs with buried SiGe or SiGeC channels', accepted for publication in IEEE Electron Device Letters.
International conferences:
M. von Haartman, J. Hållstedt, J. Seger, B. G. Malm, H. H. Radamson, P.-E. Hellström, and M. Östling, 'Low-frequency noise in SiGe channel pMOSFETs on ultra-thin SOI with Ni-silicided Source/Drain', in Proc. 18th Int. Conf. Noise and Fluctuations (ICNF), 2005, pp. 307-310.
M. von Haartman, B. G. Malm, P.-E. Hellström, and M. Östling, 'Noise in Si-based MOSFETs with high-k gate dielectrics', in Proc. 18th Int. Conf. Noise and Fluctuations (ICNF), 2005, pp. 225-230. (Invited oral presentation)
Dr von Haartman also received the following honours: 2001, Gunnar Wallquist Study Medal given to the best KTH graduate each year.  2001, Best graduate of the year by the School of Electrical Engineering, KTH. 2004, IEEE Electron Devices Society Graduate Student Fellowship
CV for Mikael Östling: He has been with the faculty of EE of KTH, Royal Institute of Technology in Stockholm, Sweden since 1984 where he holds a position as professor in solid state electronics. Since 2001 he is head of the department of microelectronics and information technology. In December 2004 he was appointed Dean, School of Information and Communication Technology, KTH.
He was a senior visiting Fulbright Scholar 1993-94 with the center for integrated systems at Stanford University, and a visiting professor with the University of Florida, Gainesville. He initiated and was appointed program director by the Swedish Foundation for Strategic Research for a silicon nanoelectronics national program 2000-2007. His research interests are silicon/silicon germanium devices and process technology for very high frequency, as well as device technology for wide bandgap semiconductors with special emphasis on silicon carbide and nitride based structures. He has supervised 20 PhD theses work, and been the author of 8 book chapters and about 300 scientific papers published in international journals and conferences. He is an editor of the IEEE Electron Device Letters and a fellow of the IEEE.